Description: Procurement of Plasma Enhanced Chemical Vapor Deposition PECVD Inductive Coupled Reactive Ion Etching ICP RIE F and required utilities on turn key basis Name of Item Equipment Plasma Enhanced Chemical Vapor Deposition PECVD Inductive Coupled Reactive Ion Etching ICP RIE F and required utilities on turn key basis
Details: Main Item: Plasma Enhanced Chemical Vapor Deposition (PECVD), Inductive Coupled Reactive Ion Etching (ICP-RIE-F) and required utilities on turn key basis (inclusive of 1 year Comprehensive warranty for both PECVD and ICE-RIE-F system) (for details refer Annexure-I). The bidder has to quote a single price for both PECVD and ICE-RIE-F system combined. Optional Item: AMC for 5 years (after completion of 1 year warranty) Bidder to quote aggregate cost for 5 years One 8x8 Semi-Auto changeover manifold for CDA Spare Parts (refer Point no. 7 of Scope of Work for shared utilities for PECVD and ICE-RIE-F system)
Sector: Science University